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Back Pall Launches Nine New Products at Semicon West to Meet the Fast Changing Needs of the Semiconductor Industry for More Advanced Technologies East Hills, NY (July 10, 2006) - - The fast growing semiconductor market’s move to narrower linewidths continues to drive the need for new and innovative filtration technologies that can achieve cleaner and purer fluids.  Pall Corporation (NYSE: PLL), a global leader in microelectronics technologies, is introducing nine new products that boost process reliability, reproducibility and productivity and help the industry meet its changing needs.  The new products for chemical, gas, photolithography and chemical mechanical polishing (CMP) applications are the latest additions to the Company’s extensive portfolio for improving the economics of integrated circuit and display manufacturing.  They will be showcased at Semicon West starting today. Chemical Applications Pall introduces two new membrane technology platforms to meet the increasing demands of single wafer and batch wet chemical processing. The UltiKleen™ Excellar ER Filter is the first 20 nanometer rated, all-fluoropolymer filter. It is a new generation of PTFE membrane design with improved surface kinetics for greater non-dewetting in aqueous and high viscosity chemicals. This filter brings a new level of retention to the industry by providing the ability to get beyond current manufacturing barriers to be able to remove the next level of contaminants. While the filter features improved retention and dewetting ability, there is no sacrifice to flow or service life. Pall is also launching the Ultipleat® SP DR Filter, a 30 nanometer rated highly asymmetric membrane filter specifically developed for wet chemical surface preparation applications.  The filter’s unique asymmetric design allows for dual retention, and its polymer material enables the filter to operate at higher temperatures than other polymers.  The filter also features improved chemical resistance, a hydrophilic surface and high flow rates. "UltiKleen™ Excellar ER and Ultipleat® SP DR Filters establish new performance benchmarks in the marketplace,” says Steve Chisolm, President of Pall Microelectronics.  "Both products are the result of close collaborative development between Pall's R&D team and industry-leading chip manufacturers and are process-proven. Customers have placed advanced orders in anticipation of their commercial release.” According to the Semiconductor Industry Association, this year, chip sales will be approximately $250 billion, a 9.8 percent increase from 2005, as consumer demand for electronic devices continues unabated. Photolithography Applications Pall is also introducing its tightest photolithography filter ever. The new PE-Kleen Filter, a 10 nanometer rated filter is now available for a broad range of lithography chemistries including 193 nm and 248 nm photoresists.  It is the Company’s latest addition to its high density, polyethylene membrane filter series, and offers exceptional defect-reducing capability while maintaining extremely low differential pressures during dispense or chemical processing. Pall’s PE-Kleen Filters have been adopted in many critical lithography applications and allow customers to adopt even finer levels of filtration without any sacrifice in pressure drop.  In point-of-use photoresist filtration, lithographers require filters that offer exceptional defect-reducing capabilities, while maintaining extremely low pressure during dispensing or chemical processing. "Over the past several years, Pall technologies have repeatedly pushed the limits of what’s possible in lithography filtration,” says Chisolm. "Our new 10 nm PE-Kleen Filter is a natural progression in our ongoing efforts to reduce defect densities and size in lithography processes, and confirms our belief that the physical limitations of lithography filtration have not yet been reached.” Also for photolithography applications, the Company is introducing a Water for Immersion System for supplying ultra-clean water, up to 2 L/min, for immersion lithography tools.  Gas Purification/Filtration Technologies Pall is showcasing three new products from the Company’s expanding family of gas purification and filtration technologies. These include PG Series Gaskleen® Purifier Assemblies and Manifolds for inert, flammable (silane, H2), corrosive and hydride gases capable of handling flow rates up to 1,000 slpm. This new series of products provides sub-parts per billion removal of molecular contaminants including moisture, oxygen, carbon dioxide, carbon monoxide, iron carbonyls and nickel carbonyls. Gaskleen® TM Sandwich Filter Assemblies (1 1/8" C-Seal) with a unique design that allows for easy integration of the filter assembly between the substrate and another component.  The sandwich filter can reduce the overall length of a gas stick or permit the addition of another component to an existing gas stick. The AccuSep® SIL Nickel Filter Assembly, designed for use in ultra-high purity bulk gas applications.  This assembly utilizes the Pall AccuSep nickel filter media, which provides removal of particles greater than 3nm with a 9-log efficiency.  CMP Applications Additionally, Pall is expanding its range of tailored, depth-style filtration products for CMP with the introduction of two new products.  The Profile® Sirius Filter, a 0.2 micron rated filter, is optimized for the retention of oversized, difficult to remove, rigid ceria particles.  Its thicker, greater depth configuration provides increased performance up to high differential pressures.  The StarKleen™ QD Capsule offers quick disconnect fittings for ease of installation close to point-of-dispense. "As we celebrate our 60th anniversary, we continue to help our customers achieve their manufacturing goals by delivering advanced engineered materials and systems solutions. Our singular focus on providing customers with filtration, separation, and purification solutions to make them more competitive is what sets Pall Microelectronics apart from others,” adds Chisolm. Pall Microelectronics is the global leader in filtration, separations and purification technologies for the microelectronics industry.  It supports the semiconductor, data storage, fiber optic, advance display and materials markets with a comprehensive suite of contamination control solutions for chemical, gas, water, chemical mechanical polishing (CMP) and photolithography processes. About Pall Corporation Pall Corporation is the global leader in the rapidly growing field of filtration, separations and purification. Pall’s business is organized around two broad markets: Life Sciences and Industrial.  The Company provides leading-edge products to meet the demanding needs of customers in biotechnology, pharmaceutical, transfusion medicine, semiconductor, water purification, aerospace and broad industrial markets. Total revenues for fiscal 2005 were $1.9 billion. The Company headquarters is in East Hills, New York with extensive operations throughout the world.  Visit Pall at www.pall.com.   ### Editor’s Notes: These products are on display at Semicon West Booth #5656, Pall executives are also available for interviews. Photos and additional information about the new products and Pall’s capabilities for the semiconductor market can be found at http://www.pall.com/corporate_40410.asp.   Media Contact Marcia Katz Director of Public Relations Telephone: 516-801-9851 Fax: 516-484-3649 Email: marcia_katz@pall.com Investor Relations Contact Patricia Iannucci V.P. Investor Relations & Communications Telephone: 516-801-9848 Fax: 516-484-3649 Email: investor_relations@pall.com Back